Late News Abstract Submission Deadline: April 9, 2026
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Program

Technical Program

The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, June 28-Wednesday, July 1, 2026, at the JW Marriott Water Street, Tampa, Florida.

As in past conferences, the meeting will be preceded (Sunday, June 28) by one day of tutorials and perspectives and a welcome reception. Sessions will take place (Monday-Wednesday, June 29-July 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 700+.

View the Technical Program

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Abstract Submission

Late News Abstract
Submission Deadline:
April 9, 2026

Submit Abstract

Awards and Travel Grants

Both ALD and ALE will recognize student achievement with awards for the best student posters and/or talks. There are also professional awards – See Awards Page. AVS will also be offering some limited travel grants to Students and Postdocs. You may apply during the conference registration process.

Tutorial Speakers

View Tutorial Abstracts
Connection between Precursor Molecules and ALD/ASD/ALE Processes
Atsushi Sakurai (Adeka Corporation R&D, Japan)
Current and Future Perspectives on Atomic Layer Deposition
W.M.M. (Erwin) Kessels (Eindhoven University of Technology, The Netherlands)
Current and Future Perspectives on Atomic Layer Etching
Thomas Tillocher (GREMI – Orleans University – CNRS, France)
Current and Future Perspectives of Area-Selective Deposition
Han-Bo-Ram (Boram) Lee (Incheon National University, South Korea
Atomic Layer Deposition from Lab-to-Fab
Paul Poodt (SparkNano and Eindhoven University of Technology, The Netherlands)
Advances in Spectroscopic Ellipsometry for ALD and ALE Thin Film Characterization
Jeremy Van Derslice (J. A. Woollam Co., Inc., USA)

ALD Plenary Speaker

ALD Invited Speakers

  • Nupur Bihari (Lam Research, USA)
  • Necmi Biyikli (University of Connecticut, USA)
  • Kyle Blakeney (Lam Research, USA)
  • Philipp Brüner (IONTOF Technologies GmbH, Germany)
  • Kazuhiro Harada (Kokusai Electric, Japan)
  • Kyooho Jung (Samsung, USA)
  • Titel Jurca (University of Central Florida, USA)
  • Tanja Kallio (Aalto University, Finland)
  • Jin-Seong Park (Hanyang University, South Korea) – ALD 2026 Innovator Awardee
  • Thomas Proslier (CEA Saclay, France)
  • Henrik Sønsteby, University of Oslo, Norway
  • Ruud van Oomen (TU Delft, The Netherlands)

ALE Plenary Speaker

ALE Invited Speakers

  • Cinzia Chan (imec, Belgium)
  • Andreas Fischer (Mattson, USA)
  • Woojin Jeon (Kyung Hee University, South Korea)
  • Neha Mahuli (Amazon AWS Pasadena, USA)
  • Wendy Yan (IBM T.J. Watson Research Center, USA)
  • Geun Young Yeom (Sungkyunkwan University, South Korea)