Committee

ALD Program Chair:
Virginia “Ginger” Wheeler
(Naval Research Laboratory, USA)

ALD Program Co-Chair:
Parag Banerjee
(University of Central Florida, USA)

ALE Program Chair:
Christophe Vallée
(University at Albany – SUNY, USA)

ALE Program Co-Chair:
Nathan Marchack
(IBM Research Division,
T.J. Watson, USA)

ALD Program Committee:

• Sumit Agarwal (Colorado School of Mines, USA)
• Ji Hwan Ahn (POSTECH, South Korea)
• Sean Barry (Carleton University, Canada)
• Stacey Bent (Stanford University, USA)
• Ageeth Bol (University of Michigan, USA)
• Hao Van Bui (Phenikaa University, Vietnam)
• Haripin Chandra (Merck KGaA, Darmstadt, Germany)
• Rong Chen (Huazhong University of Science and Technology, China)
• Rick Chen (Merck KGaA, Darmstadt, Germany)
• Hanmei Choi (Samsung Electronics, South Korea)
• Robert Clark (TEL, USA)
• Scott B. Clendenning (Intel, USA)
• John F. Conley, Jr. (Oregon State University, USA)
• Arrelaine Dameron (Forge Nano, USA)
• Neil P. Dasgupta (University of Michigan, USA)
• Jolien Dendooven (Ghent University, Belgium)
• Christophe Detavernier (Ghent University, Belgium)
• Anjana Devi (Leibniz Institute, IFW Dresden, Germany)
• Benjamin Greenberg (Naval Research Lab, USA)
• Dennis Hausmann (Lam Research, USA)
• Andrea lliberi (ASM, Belgium)
• Han-Bo-Ram (Boram) Lee (Incheon National University, South Korea)
• Wei-Min Li (Jiangsu Leadmicro Nano-Equipment Technology Ltd., China)
• Adrie Mackus (Eindhoven University of Technology, The Netherlands)
• Alex Martinson (Argonne National Labs, USA)
• Chang-Yong Nam (Brookhaven National Lab, USA)
• Michael Nolan (Tyndall University, Ireland)
• Il-Kwon Oh (Ajou University, South Korea)
• Venkat Pallem (Air Liquide, USA)
• Jin-Seong Park (Hanyang University, South Korea)
• Henrik Pedersen (Linköping University, Sweden)
• Paul Poodt (SparkNano, The Netherlands)
• Mikko Ritala (University of Helsinki, Finland)
• Seung Wook Ryu (SK hynix, South Korea)
• Arpita Saha (Oxford Instruments, UK)
• Atsushi Sakurai (Adeka Corporation, Japan)
• Tania Sandoval (Universidad Técnica Federico Santa María, Chile)
• Nathanaelle Schneider (CNRS Photovoltaics, France)
• Sami Sneck (Beneq, Finland)
• Ruud Van Ommen (Delft University of Science & Technology, The Netherlands)
• Paul Williams (Pegasus Chemicals, UK)
• Charles H. Winter (Wayne State University, USA)
• Keith Wong (Applied Materials, USA)
• Seung-Yeol Yang (Samsung Electronics, South Korea)
• Angel Yanguas-Gil (Argonne National Lab, USA)
• Junjie Zhao (Zhejiang University, China)

ALD International Advisory Committee:

• Annelies Delabie (IMEC, Belgium)
• Anjana Devi (Leibniz Institute, IFW Dresden, Germany)
• Jeffrey Elam (Argonne National Lab, USA)
• Steven George (University of Colorado at Boulder, USA)
• Cheol Seong Hwang (Seoul National University, South Korea)
• Hyeongtag Jeon (Hanyang University, South Korea)
• Erwin Kessels (Eindhoven University of Technology, The Netherlands)
• Hyungjun Kim (Yonsei University, South Korea)
• Sang In Lee (Synos Foundation, USA)
• Markku Leskelä (University of Helsinki, Finland)
• Gregory N. Parsons (North Carolina State University, USA)
• Viljami Pore (ASM, Finland)

ALD Steering Committee:

• Steven George (University of Colorado at Boulder, USA)
• Erwin Kessels (University of Eindhoven, The Netherlands)
• Hyungjun Kim (Yonsei University, South Korea)
• Gregory N. Parsons (North Carolina State University, USA

ALE Program Committee:

• Keun Hee Bai (Samsung Electronics Co., South Korea)
• Andrew Cavanagh (University of Colorado at Boulder, USA)
• Heeyeop Chae (Sungkyunkwan University, South Korea)
• Sung-Il Cho (Samsung Electronics Co., South Korea)
• Jean-Francois de Marneffe (IMEC, Belgium)
• Rémi Dussart (GREMI, Polytech Orleans, France)
• Jeff Elam (Argonne National Laboratory, USA)
• Elina Färm (ASM Microchemistry Oy, Finland)
• Steve George (University of Colorado at Boulder, USA)
• Craig Huffman (Oxford Instruments, UK)
• Yohei Ishii (Hitachi High Technologies USA)
• Eric Joseph (IBM, USA)
• Keren Kanarik (Lam Research, USA)
• Erwin Kessels (Eindhoven University of Technology, The Netherlands)
• Harm Knoops (Oxford Instruments, UK)
• Thorsten Lill (Clarycon Nanotechnology Research, USA)
• Eric Liu (TEL, USA)
• Anil Mane (Applied Materials, USA)
• Dominik Metzler (Black Semiconductor GmBH, Germany)
• Austin Minnich (CalTech, USA)
• Tero Pilvi (Applied Materials, Finland)
• Nicolas Possémé (CEA-Leti, France)
• Tatayana Rakhimova (Lomonosov Moscow State University Skobeltsyn Institute, Russia)
• Fred Roozeboom (University of Twente, The Netherlands)
• Huichan Seo (SK hynix, South Korea)
• Dmitry Suyatin (AlixLabs and Lund University, Sweden)
• Geun Young Yeom (Sungkyunkwan University, South Korea)

ALE Steering Committee:

• Craig Huffman (Micron, USA)
• Eric Joseph (IBM, USA)
• Keren Kanarik (Lam Research, USA)
• Steve George (University of Colorado at Boulder, USA)