Overview

The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, June 28-Wednesday, July 1, 2026, at the JW Marriott Water Street, Tampa, Florida.

As in past conferences, the meeting will be preceded (Sunday, June 28) by one day of tutorials and perspectives and a welcome reception. Sessions will take place (Monday-Wednesday, June 29-July 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 700+. View List of Invited Speakers

Abstract Submission

Program Chair:
Virginia “Ginger” Wheeler
(Naval Research Laboratory, USA)

Program Co-Chair:
Parag Banerjee
(University of Central Florida, USA)

Program Chair:
Christophe Vallée
(University at Albany – SUNY, USA)

Program Co-Chair:
Nathan Marchack
(IBM, USA)